ASML has delivered a first-generation Twinscan EXE:5000 High-NA extreme ultraviolet (EUV) lithography scanner to Intel, seven years after Intel first ordered the machine. The High numerical aperture ...
Morning Overview on MSN
China reportedly reverse-engineered the world’s top chipmaking tool
China is now accused of doing what Washington spent years trying to prevent: building its own version of the world’s most advanced chipmaking tool and edging closer to independence from foreign ...
According to a report from Tom's Hardware, China's so-called "Frankenstein" EUV scanner was assembled from mismatched parts sourced through various channels, potentially including surplus equipment ...
Intel has made significant strides in implementing High-NA EUV lithography by installing two High-NA litho machines, developing custom reticles as well as all-new optical proximity correction, and ...
Christophe Fouquet, President, CEO and Chair of the Board of Management, announced the reappointment of Roger Dassen and Frederic Schneider-Maunoury to the Board of Management and the appointment of ...
A new technical paper titled “Controlling Speckle Contrast Using Existing Lithographic Scanner Knobs to Explore the Impact on Line Width Roughness” was published by researchers at Samsung, ASML and ...
In a recent episode of In Good Company—hosted by Nicolai Tangen, CEO of Norges Bank Investment Management—Christophe Fouquet, President and CEO of ASML, delivered a pointed analysis of the ...
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